晶圓研磨GNX200BP晶圓減薄Wafer Grinding |
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價(jià)格: 元(人民幣) | 產(chǎn)地:本地 |
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上架時(shí)間:2021-03-25 10:02:03 | 瀏覽量:139 | |
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晶圓研磨GNX200BP晶圓減薄Wafer Grinding 晶圓研磨GNX200BP晶圓減薄/Wafer Grinding概要 GNX200BP Wafer Grinding is a fully automatic continuous downfeed grinding machine. Wafers are handled through the machine by a robot, and load/unload arms. Two different stations are used for wafer cleaning after the final grind station. Chuck speed, grinding wheel, and grind spindle downfeed rate speeds can be used to manipulate grinder throughput, surface finish, and wheel life. A two-point in-process gauge measuring system controls wafer thickness under grind spindles 1 and 2. A three-point grind spindle angle adjustment mechanism is utilized for easily maintaining wafer profile (ttv); with the option a motorized adjustment. After completion at the grind station, the wafer transfers to Polish unit automatically. The local polishing unit removes subsurface damage for increased wafer die strength, and the ability to handle final thickness of 50 microns. 晶圓研磨GNX200BP晶圓減薄Wafer Grinding相關(guān)產(chǎn)品: 衡鵬供應(yīng) GDM300晶圓研磨/晶圓減薄/晶圓拋光/晶圓背拋/Wafer Grinding |
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